Extending the resolution of Maskaligner lithography

Extending the resolution of Maskaligner lithography
for a highly sensitive electrochemical assay system
Mittwoch, 06.03.2013 16:00 — 18:00

Referent

Stefan Partel

6. März 2013, 16:00 Uhr

FH Vorarlberg, Raum W2 06

Abstrakt

In this talk the fabrication process and the analysis procedure of a highly sensitive biosensor is presented. The dense patterning of electrodes and a so called redox cycling process allow an increase of sensitivity. The sensing mechanism and the electrochemistry are discussed in more detail according to the sensor design. The dense pattern of electrodes requires an optimization of the photolithography process. Simulation of light propagation and photoresist modeling can help to optimize the fabrication process and reach new limits of the Mask-Aligner lithography. Simulation results and dissolution rate monitoring for parameter determination for photoresist modeling are shown.